Shihnan Hsiao

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Speaker, Author, Co-Author

Fri. Sep 11, 2020 8:30 AM - 9:30 AM Z03

Oral presentation
| 8 Plasma Electronics
| 8.6 Plasma Electronics English Session

[11a-Z03-1~4] 8.6 Plasma Electronics English Session

9:15 AM - 9:30 AM

▲ [11a-Z03-4] Influence of temperature on etch rate of PECVD-SiN films with CF₄/H₂ plasma

〇Shihnan Hsiao¹, Kazuya Nakane¹, Takayoshi Tsutsumi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Center for Low-temperature Plasma Sciences, Nagoya University)