Shogo Shigemasu

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Speaker, Author, Co-Author

Thu. Sep 10, 2020 12:30 PM - 5:30 PM Z10

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10p-Z10-1~17] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

1:45 PM - 2:00 PM

[10p-Z10-5] Prevention of F diffusion using FLA after W deposition

〇Shogo Shigemasu¹, Hideaki Tanimura¹, Hikaru Kawarazaki¹, Shinichi Kato¹, Yoshihide Nozaki¹ (1.SCREEN SPE)