Takeshi Aizawa

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Speaker, Author, Co-Author

Fri. Sep 11, 2020 1:30 PM - 4:15 PM Z03

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-Z03-3~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:00 PM - 4:15 PM

[11p-Z03-12] Investigation of Radical Radiation Intensity Distribution and Photoresist Removal Rate Distribution in Microwave Excited Water Vapor Plasma

〇Takeshi Aizawa¹, Sakurai Tasuku¹, Ishijima Tatsuo¹, Tanaka Yasunori¹, Yusuke Nakano¹ (1.Kanazawa Univ.)