The 81st JSAP Autumn Meeting, 2020

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21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[10a-Z20-1~12] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Thu. Sep 10, 2020 9:00 AM - 12:15 PM Z20

Yutaka Furubayashi(Kochi Univ. of Tech.), Hiroyuki Nishinaka(Kyoto Inst. of Tech.)

11:00 AM - 11:15 AM

[10a-Z20-8] TEM observation of epitaxial NiO thin films deposited by RF reactive magnetron sputtering

〇Keisuke Nishimoto1, Mutsumi Sugiyama1,2 (1.Tokyo Univ. Sci, 2.RIST)

Keywords:NiO, epitaxial, sputter