1:15 PM - 1:30 PM
▼ [10p-Z26-2] Mica Nanosheet Patterned Etching Using Focused Electron Beam
Keywords:Mica nanosheets, Scanning Auger electron microscopy, Atomic force microscopy
The sample was single-crystal oxide of artificially-synthesized phlogopite (KMg3AlSi3O10F2), one of mica family, which was exfoliated and the mica nanosheets with ~10 nm thick were affixed on a Si substrate. Figures 1(b) and (c) show the SEM and AFM images etched by the FEB; where few layers (3-5 layers) mica nanosheets were selectively removed by 10 keV and 10 nA beam voltage and current respectively. The etched areas were analyzed by AES spectra. Accordingly, it was deduced that the FEB irradiation dissociates the mica compounds on the surface. The effects of beam current, energy, and scan time were investigated as controlling parameters. The technique enables nanoscale, iterative patterning of mica nanosheets, which can widen the application of mica-based 2D heterostructures and devices.