[11a-Z07-1~9] 6.3 Oxide electronics

[11a-Z07-8] BiVO₄ thin film formation and visible light response evaluation of photocatalys

〇Tomoki Konishi^1,2, Takahiko Ban^1,2, Shinichi Yamamoto^1,2 (1.Ryukoku Univ., 2.Yamamoto Inst.)

Keywords:photocatalyst, bismuth vanadium oxide

We aimed to make the BiVO₄ photocatalyst thin by using a high frequency magnetron sputtering system. Sputter deposition was performed under each condition of 30_60_90_600 min. The condition was also changed depending on the annealing time and
temperature. In addition, a procedure for forming V₂O₅ on the substrate was added in the pre-process and post-process of the sputter film formation. As a result, it was possible to confirm the thinning of BiVO₄ and the photocatalytic reaction from the film formed at 600 min. and the film formed from V₂O₅ before the sputtering process.