10:15 AM - 10:30 AM
△ [11a-Z10-7] Evaluation of the SiN Film Formed by Atomic Layer Deposition on Trench Si Substrate.
Keywords:ALD, SiN, Trench
Oral presentation
13 Semiconductors » 13.3 Insulator technology
Fri. Sep 11, 2020 8:30 AM - 11:15 AM Z10
Yuuichiro Mitani(Tokyo City University)
10:15 AM - 10:30 AM
Keywords:ALD, SiN, Trench