[11p-Z02-1~19] 15.4 III-V-group nitride crystals

△ [11p-Z02-10] MOVPE Growth of AlN on Annealed Sputtered AlN Templates with Nano Pattern

〇Yukino Iba¹, Kanako Shojiki¹, Shigeyuki Kuboya², Kenjiro Uesugi², Shiyu Xiao³, Hideto Miyake^3,1 (1.Grad. Sch. of Eng. Mie Univ., 2.SPORR Mie Univ., 3.Grad. Sch. of RIS Mie Univ.)

Keywords:MOVPE, AlN, nano-pattern

We have reported that the low-TDD-AlN film could be obtained by performing a face-to-face annealing for a sputter-deposited AlN films (FFA Sp-AlN). On the other hand, effects of AlN film crystallinity depends on MOVPE growth conditions on nanopatterns have not been clarified. In this study, we conducted metalorganic vapor phase epitaxy on nano-patterned FFA Sp-AlN with varied growth temperature. Thereafter, crystal quality was elucidated by transmission electron microscope (TEM), atomic force microscope (AFM) and X-ray diffraction rocking curve (XRC) measurements.