2020年第81回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

1 応用物理学一般 » 1.4 エネルギー変換・貯蔵・資源・環境

[8p-Z22-1~14] 1.4 エネルギー変換・貯蔵・資源・環境

2020年9月8日(火) 13:00 〜 16:45 Z22

小栗 和也(東海大)、藤井 克司(理研)

13:00 〜 13:15

[8p-Z22-1] High thermoelectric performance of Si-Ge alloy by modifying the electronic structure

〇(PC)Omprakash Muthusamy1、Saurabh Singh1,3、Masahiro Adachi2、Yoshiyuki Yamamoto2、Tsunehiro Takeuchi1,3,4,5 (1.Toyota Tech. Inst、2.Sumitomo Ele. Ind.、3.CREST、4.MIRAI、5.Nagoya Univ.)

キーワード:Si-Ge, ball milling, thermoelectric property

In order to improve the figure of merit ZT, many strategies have been reported. For example, the nano-structuring and modulation doping approach has been utilized to improve the thermoelectric properties of Si-Ge alloy by decreasing thermal conductivity without degrading the power factor.
Our previous studies revealed that the B-doped Si-Ge-Au thin film and bulk sample possessed a ZT value of 1.38 and 1.63 at 1000K. We found that the electron transport properties were constructively improved using Au-doping to form an impurity state near the valence band top, and B-doping to control the Fermi level. Very small thermal conductivity ~ 1.5 Wm-1K-1 was obtained due to nanograins. However, Au is an expensive element, and more than ZT = 1.63 is required for improving efficiency. In the present study, we synthesized bulk noncrystalline B-doped Si-Ge alloy with other metal substitution, which is a cheap and non-toxic element. Thermoelectric properties (TE) of bulk nanocrystalline samples were investigated as a function of temperature 300 – 1000 K, respectively.