1:30 PM - 2:10 PM
[9p-Z02-1] Preparation of High-quality AlN Templates and Its Application for Deep Ultraviolet Devices
Keywords:nitride semiconductor, AlN, annealing
Combination of sputter deposition and high-temperature annealing is a promising technique for preparing AlN templates with a low threading dislocation density.By optimizing the fabricating conditions, a TDD of 4 × 107 cm−2 was achieved for the crack-free AlN template. The high-quality AlN templates are expected to breed high-performance nitride-based UV-LEDs and electronic devices.