2020年第81回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

4 JSAP-OSA Joint Symposia 2020 » 4.1 Plasmonics and Nanophotonics

[9p-Z16-1~14] 4.1 Plasmonics and Nanophotonics

2020年9月9日(水) 13:00 〜 17:45 Z16

Smith Nicholas(阪大)、田中 拓男(理研)

16:30 〜 16:45

[9p-Z16-10] Quantification of induced local stress birefringence due to elastic inhomogeneity with surface plasmon microscopy towards label free detection of dermatoheliosis

〇(D)Ipsita Chakraborty1、Hiroshi Kano1 (1.Muroran Inst of Tech)

キーワード:focused surface plasmon (FSP), stress birefringence, eccentricity

We study the relationship of induced local stress birefringence with the spatial frequency response of focused surface plasmon of thin film samples as a result of inhomogeneous elasticity. The change in eccentricity of the absorption pattern at the back focal plane of the microscope is a label free quantifier of local induced stress birefringence in the sample.