5:00 PM - 5:15 PM
[9p-Z18-15] Microprocessing of 10-nm films by two-beam laser ablation
Keywords:Laser ablation, Membrane, Nanofabrication
In recent years, the processing of thin films with a thickness of less than 100 nm is required in the development of transmission-type electron optical elements in electron microscopy and the manufacture of MEMS (micro opto electronic systems).
We have demonstrated the fabrication of 10-nm-thick films with a submicrometer resolution by laser ablation, whereas treat such thin material is difficult to achieve by conventional chemical etching or FIB (focused ion beam) milling process.
This technique can process the nanomembranes efficiently and conveniently compared to other methods, resulting novel nanofabrication by light.
We have demonstrated the fabrication of 10-nm-thick films with a submicrometer resolution by laser ablation, whereas treat such thin material is difficult to achieve by conventional chemical etching or FIB (focused ion beam) milling process.
This technique can process the nanomembranes efficiently and conveniently compared to other methods, resulting novel nanofabrication by light.