Yuuto Kawato

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Speaker, Author, Co-Author

Fri. Mar 13, 2020 9:00 AM - 10:30 AM A205 (6-205)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[13a-A205-1~6] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:15 AM - 10:30 AM

[13a-A205-6] Chemical bonding state of AlN film deposited in low gas pressure and low-temperature sputtering conditions

〇Yuuto Kawato¹, Mizuho Yoshizuka¹, Taisei Motomura², Tatsuo Tabaru², Masato Uehara², Tetsuya Okuyama¹ (1.NIT Kurume College, 2.AIST)