4:15 PM - 4:30 PM
[13p-A409-11] WVTR of Al2O3 film deposited at room temperature using Pure-Ozone-ALD process with TMA
〇Ayaka Abe1, Takayuki Hagiwara1, Naoto Kameda1, Toshinori Miura1, Yoshiki Morikawa1, Mitsuru Kekura1, Ken Nakamura2, Hidehiko Nonaka2 (1.MEIDENSHA CORPORATION, 2.AIST)