Kentaro Saito

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Speaker, Author, Co-Author

Fri. Mar 13, 2020 9:00 AM - 12:15 PM D221 (11-221)

Oral presentation
| 6 Thin Films and Surfaces
| 6.4 Thin films and New materials

[13a-D221-1~12] 6.4 Thin films and New materials

9:00 AM - 9:15 AM

[13a-D221-1] A study on low temperature atomic layer deposition of aluminum nitride using plasma excited ammonia

〇(M2)Kentaro Saito¹, Kazuki Yoshida¹, Kensaku Kanomata², Masanori Miura², Bashir Ahmmad¹, Shigeru Kubota¹, Fumihiko Hirose¹ (1.Yamagata Univ., 2.ROEL Yamagata Univ.)

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