Katsuto Tanahashi

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Speaker, Author, Co-Author

Sun. Mar 15, 2020 9:00 AM - 12:00 PM D411 (11-411)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal characterization, impurities and crystal defects

[15a-D411-1~11] 15.7 Crystal characterization, impurities and crystal defects

11:00 AM - 11:15 AM

[15a-D411-8] Diffusion of boron in silicon under internal stress field

〇Katsuto Tanahashi¹, Koji Sueoka², Hidetaka Takato¹ (1.AIST, 2.Okayama Pref. Univ.)