[12a-B410-1~8] 3.7 Laser processing

[12a-B410-1] Fabrication of electron hologram by single-shot laser interference processing thin membrane

〇Ryota Fukushima^1,2, Yuuki Uesugi², Koh Saitoh³, Shunichi Sato² (1.Eng., Tohoku Univ., 2.IMRAM, Tohoku Univ., 3.IMaSS, Nagoya Univ.)

Keywords:interference processing, femtosecond laser, electron hologram

We have developed an optical system of two-beam interference processing using femtosecond laser to fabricate an electron phase hologram for electron microscopy. Thin membranes with a thickness of several tens of nm can be processed by a single-shot irradiation with the holographic pattern. By shortening the laser wavelength from the conventional 1040 nm to 520 nm via the second harmonic generation process, higher resolution processing was achieved. The grating spacing of the electron hologram was improved from 1.5 μm to 0.75 μm. We will also show the results of investigations for appropriate hologram materials and laser processing conditions.