The 67th JSAP Spring Meeting 2020

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16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

[12p-A403-1~15] 16.3 Bulk, thin-film and other silicon-based solar cells

Thu. Mar 12, 2020 1:15 PM - 5:30 PM A403 (6-403)

Keisuke Ohdaira(JAIST), Daiji Kanematsu(Panasonic), Shinsuke Miyajima(Tokyo Tech)

4:15 PM - 4:30 PM

[12p-A403-11] Physical property of silicon oxide film by atomic layer deposition method

〇(D)Kenshiro Usuki1,2, Mochizuki Toshimitsu2, Tanahashi Katsuto2, Takato Hidetaka2, Yamaguchi Katsuhiko1 (1.Fukushima Univ., 2.AIST)

Keywords:atomic layer deposition method