Effect of hydrogen plasma treatment on the passivation performance of TiO<em><sub>x</sub></em> on crystalline silicon prepared by atomic layer deposition

Shinsuke Miyagawa; Kazuhiro Gotoh; Markus Wilde; Shohei Ogura; Yasuyoshi Kurokawa; Katsuyuki Fukutani; Noritaka Usami

Presentation information

Oral presentation

16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

[12p-A403-1~15] 16.3 Bulk, thin-film and other silicon-based solar cells

Thu. Mar 12, 2020 1:15 PM - 5:30 PM A403 (6-403)

Keisuke Ohdaira(JAIST), Daiji Kanematsu(Panasonic), Shinsuke Miyajima(Tokyo Tech)

3:15 PM - 3:30 PM

[12p-A403-8] Effect of hydrogen plasma treatment on the passivation performance of TiO_x on crystalline silicon prepared by atomic layer deposition

〇Shinsuke Miyagawa¹, Kazuhiro Gotoh¹, Markus Wilde², Shohei Ogura², Yasuyoshi Kurokawa¹, Katsuyuki Fukutani², Noritaka Usami¹ (1.Graduate School of Eng., Nagoya Univ., 2.Institute of Industrial Sci., The Univ. of Tokyo)

Keywords:titanium oxide, passivation, hydrogen plasma treatment

Presentation information

[12p-A403-1~15] 16.3 Bulk, thin-film and other silicon-based solar cells

[12p-A403-8] Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition

[12p-A403-8] Effect of hydrogen plasma treatment on the passivation performance of TiO_x on crystalline silicon prepared by atomic layer deposition