Dominant Factors of the Passivation Performance of TiOx/SiOx/Si Heterostructure Revealed by Nuclear Reaction Analysis and Atomic Force Microscope

Yuta Nakagawa; Kazuhiro Gotoh; Markus Wilde; Shohei Ogura; Yasuyoshi Kurokawa; Katsuyuki Fukutani; Noritaka Usami

Presentation information

Oral presentation

16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

[12p-A403-1~15] 16.3 Bulk, thin-film and other silicon-based solar cells

Thu. Mar 12, 2020 1:15 PM - 5:30 PM A403 (6-403)

Keisuke Ohdaira(JAIST), Daiji Kanematsu(Panasonic), Shinsuke Miyajima(Tokyo Tech)

3:30 PM - 3:45 PM

[12p-A403-9] Dominant Factors of the Passivation Performance of TiO_x/SiO_x/Si Heterostructure Revealed by Nuclear Reaction Analysis and Atomic Force Microscope

〇Yuta Nakagawa¹, Kazuhiro Gotoh¹, Markus Wilde², Shohei Ogura², Yasuyoshi Kurokawa¹, Katsuyuki Fukutani², Noritaka Usami¹ (1.Graduate School of Eng., Nagoya Univ., 2.Institute of Industrial Sci., The Univ. of Tokyo)

Keywords:titanium oxide, passivation, nuclear reaction analysis

Presentation information

[12p-A403-1~15] 16.3 Bulk, thin-film and other silicon-based solar cells

[12p-A403-9] Dominant Factors of the Passivation Performance of TiOx/SiOx/Si Heterostructure Revealed by Nuclear Reaction Analysis and Atomic Force Microscope

[12p-A403-9] Dominant Factors of the Passivation Performance of TiO_x/SiO_x/Si Heterostructure Revealed by Nuclear Reaction Analysis and Atomic Force Microscope