[12p-PA2-1~4] 7 Beam Technology and Nanofabrication

[12p-PA2-1] Reaction induced electron beam of resist material based on Cu complex

〇Ayako Nakajima¹, Takahiro Kozawa¹ (1.Osaka Univ. ISIR)

Keywords:EB lithography, resist, complex

An alternative resist material was developed to break through the RLS trade-off. We focused complexes which contain metal atoms uniformly due to improve sensitivity. This presentation shows the qualities of synthesized Cu complexes as a resist material.