[13a-B410-1~9] 3.7 Laser processing

[13a-B410-7] Growth Rate of Microswelling Structure on Silicone Rubber Fabricated by ArF Laser Irradiation

〇Misaki Yokoyama¹, Tsuyoshi Yoshida¹, Nobuyuki Matsuki², Masayuki Okoshi¹ (1.National Defense Academy, 2.Kanagawa Univ.)

Keywords:ArF excimer laser, Silicone rubber, Microswelling structure

In previous work, the fabrication of super-hydrophobic silicone rubber surface with periodic microswelling structures by 193-nm ArF excimer laser irradiation was reported. Since the hydrophobicity of materials is controlled by the surface structure of the material surface. Hence, it is expected that the hydrophobicity of silicone rubber can be controlled by optimizing the height and diameter of the microswelling structures. To control the shape of the microswelling structures, it is necessary to elucidate the growth mechanism of the structure. In this presentation, the height determination mechanism of the microswelling structure will be discussed based on the laser fluence dependence of the structure grow rate.