[13a-PB3-1~9] 22.1 合同セッションM 「フォノンエンジニアリング」

▲ [13a-PB3-8] Effects of phase shift mask design on three-dimension nanostructure fabrication

〇(M2C)Pongsakorn Sihapitak¹、Yasuaki Ishikawa¹、Xudongfang Wang¹、Mutsunori Uenuma¹、Yukiharu Uraoka¹ (1.NAIST)

キーワード：thermoelectrics, proximity-field nanopatterning (PnP) process, RSOFT simulation software

The proximity-field nanopatterning (PnP) process is a promising approach to fabricate a three-dimensional (3D) nanostructure to achieve high efficiency and flexible thermoelectric devices. In this research, the phase shift mask, which can generate light diffraction, results in producing the periodic 3D nanostructure in the photoresist, has been studied. As to improve the efficiency of the thermoelectric device, the phase shift mask designs have been investigated by using the RSOFT simulation software to find the size limitation of the nanostructure that the PnP process can fabricate. The results show that the decrease in the size of the nanostructure can be achieved by changing the periodicity in the simulation in this case from the periodicity 600 nm to 300 nm successfully. Finally, it may be concluded that the periodicity 300 nm is the limiting size for the PnP process performed by the simulation.