[14a-PA4-1~5] 13.3 絶縁膜技術

▲ [14a-PA4-5] Reduction of Hydroxyl in the Low-Temperature Si Oxide Films Fabricated under Various Deposition Conditions

〇Weiqi Zhou¹、Susumu Horita¹ (1.JAIST)

キーワード：Silicon oxide, CVD, Low temperature

APCVD method with silicone oil and ozone gas was used to fabricate Si oxide films. In this meeting, we will discuss about the reduction of hydroxyl that generated during deposition reaction.