The 67th JSAP Spring Meeting 2020

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[14p-A302-1~18] 15.4 III-V-group nitride crystals

Sat. Mar 14, 2020 1:45 PM - 6:45 PM A302 (6-302)

Makoto Saito(Tohoku Univ.), Hisashi Murakami(TUAT), Shugo Nitta(Nagoya Univ.)

2:00 PM - 2:15 PM

[14p-A302-2] GaN bulk crystal growth by acidic ammonothermal method using a 4-inch-diam. autoclave

kouhei kurimoto1,2, quanxi bao1,2, makoto saito1,3, yutaka mikawa3, rinzo kayano2, kouhei shima1, kazunobu kojima1, toru ishiguro1, shigefusa chichibu1 (1.IMRAM-Tohoku Univ., 2.Japan Steel Works, 3.Mitsubishi Chemical Corp.)

Keywords:GaN, Ammonothermal Method, bulk Crystal

The acid ammonothermal method is expected as one of mass production methods for large diameter bulk GaN crystals.We have reported that we succeeded in growth using a 4-inch size seed crystal by conducting a crystal growth experiment by introducing a GaN crystal growth autoclave with an inner diameter of 120 mm capable of manufacturing 4-inch diameter wafers.In this talk, we report on the latest achievements of crystal growth using the autoclave.