2020年第67回応用物理学会春季学術講演会

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10 スピントロニクス・マグネティクス » 10 スピントロニクス・マグネティクス(ポスター)

[14p-PA1-1~74] 10 スピントロニクス・マグネティクス

2020年3月14日(土) 13:30 〜 15:30 PA1 (第3体育館)

13:30 〜 15:30

[14p-PA1-17] Preparation of topological semimetal CoSi thin films for spin-orbit torque devices

〇(M1)Ke Tang1,2、Zhenchao Wen2、Qingyi Xiang2、Hiroaki Sukegawa2、Seiji Mitani1,2 (1.Univ. of Tsukuba、2.NIMS)

キーワード:Semimetal, Spin Hall effect, Spin Hall magnetoresistance

In order to realize the practical application of spin-orbit torque devices, it’s important to find materials with large spin Hall effect. Very recently, CoSi was predicted as a kind of new topological semimetal possessing Weyl points near the Fermi energy in its electronic band structure, which may generate significantly intrinsic contribution to spin Hall effect. In this work, polycrystalline CoSi films were fabricated by magnetron sputtering and the spin Hall angle of the CoSi films was evaluated to be around 3.5%, which is large for material systems without heavy metals.