1:30 PM - 3:30 PM
[14p-PB4-15] Lateral Etching of Aluminum Thin Film Deposited on Glass Substrate using Atmospheric-Pressure Plasma Jet
Keywords:atmospheric-pressure plasma, aluminum, etching
An atmospheric-pressure plasma jet was irradiated onto the aluminum (Al) film deposited on a glass substrate.
The Al film was etched in the lateral direction after 60 min of plasma irradiation.
The surface temperature on the Al film was measured using a thermocamera, and the surface temperature was about 66℃ after 60 min of plasma irradiation.
The Al film was etched in the lateral direction after 60 min of plasma irradiation.
The surface temperature on the Al film was measured using a thermocamera, and the surface temperature was about 66℃ after 60 min of plasma irradiation.