[15a-A501-1~13] 10.1 Emerging materials in spintronics and magnetics (including fabrication and charactrization methodologies)

▼ [15a-A501-12] Fabrication of L1₀-FeNi films with high degree of order by denitriding FeNiN films

〇Keita Ito^1,2, Masahiro Hayashida¹, Tomoyuki Koganezawa³, Takahiro Nishio⁴, Sho Goto⁴, Hiroaki Kura⁴, Masaki Mizuguchi^1,2, Hideto Yanagihara⁵, Koki Takanashi^1,2,6 (1.IMR, Tohoku Univ., 2.CSRN, Tohoku Univ., 3.JASRI, 4.DENSO CORPORATION, 5.Dept. of Appl. Phys., Univ. of Tsukuba, 6.CSIS, Tohoku Univ.)

Keywords:L10-FeNi, denitriding