2020年第67回応用物理学会春季学術講演会

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一般セッション(口頭講演)

6 薄膜・表面 » 6.1 強誘電体薄膜

[15a-D419-1~12] 6.1 強誘電体薄膜

2020年3月15日(日) 09:00 〜 12:15 D419 (11-419)

小林 健(産総研)、吉田 慎哉(東北大)

10:15 〜 10:30

[15a-D419-6] Fabrication of Pure-Perovskite-Phase Sm-Doped Pb(Mg1/3Nb2/3)O3-PbTiO3 Epitaxial Thin Film on Si by Magnetron Sputter using Powder Target

Xuanmeng Qi1、Shinya Yoshida1、Shuji Tanaka1 (1.Tohoku Univ.)

キーワード:Sm doped PMN-PT, PZT-based seed layer, Separate deposition

A single crystal of Sm-doped Pb(Mg1/3Nb2/3)O3-PbTiO3 (Sm-PMN-PT) exhibited a world-leading high d33 value. Its monocrystalline thin film is also expected to provide a giant piezoelectricity, and thus to have a potential to break the performance limitation of Pb(Zr,Ti)O3 (PZT)-based MEMS. However, the epitaxial growth of such a PMN-PT-based thin film with a thickness of a few micrometers for MEMS is generally uneasy due to the thermodynamics instability.
In this study, we succeeded the reproducible sputter epitaxy of a (001)-oriented Sm-PMN-PT thin film on a Si substrate by introducing a PZT-based seed layer and separate deposition technique enhancing a homogeneous distribution of the composition in the film. A ~2-μm-thick Sm-PMN-PT epitaxial thin film was successfully fabricated on Si by this unique method in this study. We believe that this achievement is a great step to create a giant piezoelectric transducer thin film for high-performance piezoelectric MEMS actuators.