The 67th JSAP Spring Meeting 2020

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[15p-A302-1~12] 15.4 III-V-group nitride crystals

Sun. Mar 15, 2020 1:45 PM - 5:00 PM A302 (6-302)

Narihito Okada(Yamaguchi Univ.), Hideaki Murotani(Tokuyama College)

4:30 PM - 4:45 PM

[15p-A302-11] [Highlight]Ultraviolet-B laser diode with composition-graded p-AlGaN
on lattice-relaxed Al0.6Ga0.4N with sapphire substrate

Kosuke Sato1,2, Shinji Yasue2, Kazuki Yamada2, Shunya Tanaka2, Tomoya Omori2, Sayaka Ishizuka2, Shohei Teramura2, Yuya Ogino2, Sho Iwayama2,3, Hideto Miyake3, Motoaki Iwaya2, Tetsuya Takeuchi2, Satoshi Kamiyama2, Isamu Akasaki2,4 (1.Asahi-Kasei, 2.Meijo Univ., 3.Mie Univ., 4.Nagoya Univ.)

Keywords:nitride, laser diode, ultraviolet

UVB-LD on sapphire substrate was realized using lattice-relaxed n-Al0.6Ga0.4N underlying layer and III-composition-graded p-AlGaN cladding layer previously developed by our group. The gain-guided LD with resonator length of 300 μm shows threshold current of 0.90 A (current density of 67 kA/cm2), voltage of 27.8V and wavelength of 298 nm with multimodal laser spectrum.