Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[13p-N203-1~10] 6.4 Thin films and New materials

Mon. Sep 13, 2021 1:30 PM - 4:00 PM N203 (Oral)

Tetsuo Tsuchiya(AIST), Hiroaki Nishikawa(Kindai Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 1:45 PM

[13p-N203-1] Electronic structure measurements of Pt/AlFeO₃/Nb:SrTiO₃ hetero-film for resistance switching material by high resolution X-ray absorption spectroscopy

〇Yuri Endo¹, Kato Seiya¹, Nakajima Nobuo¹, Badari Narayana Rao², Yasui Shintaro³, Osawa Hitoshi⁴, Kawamura Naomi⁴ (1.Hiroshima Univ., 2.Chiba Univ., 3.Tokyo Inst. Tech., 4.JASRI)

1:45 PM - 2:00 PM

△ [13p-N203-2] PLD synthesis and characterization of aliovalent-doped layered La-Ni-O system epitaxial films

〇(M2)Shohei Hisatomi¹, Yuki Goto¹, Tomoaki Oga¹, Satoru Kaneko^2,1, Mamoru Yoshimoto¹, Akifumi Matsuda¹ (1.Tokyo Tech, 2.KISTEC)

2:00 PM - 2:15 PM

△ [13p-N203-3] Preliminary synthesis of LiNi_0.67Mn_0.33O₂ epitaxial thin films
for designing compositionally graded thin film LiNi_xMn_yCo_zO₂

〇(M1)Kanta Suzuki¹, Kenichi Kaminaga¹, Shingo Maruyama¹, Yuji Matsumoto¹ (1.Tohoku Univ.)

2:15 PM - 2:30 PM

△ [13p-N203-4] Photocatalysis of compositionally-graded Mg-doped ZnO thin films

〇(M2)Yuta Sato¹, Shingo Maruyama¹, Kenichi Kaminaga¹, Yuji Matsumoto¹ (1.Tohoku Univ.)

2:30 PM - 2:45 PM

△ [13p-N203-5] Combinatorial synthesis for n-type oxide semiconductor based channel materials for tunnel FETs

〇Yuki Daimon^1,2, Toyohiro Chikyow², Astushi Ogura^1,3, Takahiro Nagata^2,3 (1.Meiji Univ., 2.NIMS, 3.MREL)

2:45 PM - 3:00 PM

△ [13p-N203-6] Fabrication of TiO₂ Optical Thin Film with Low Refractive Index by Combination Deposition

〇Mai Hayamizu¹, Hiroshi Murotani², Shigeharu Matsumoto³ (1.Grad. Sch. of Sci. and Tech., Tokai Univ., 2.Tokai Univ., 3.SHINCRON CO., LTD.)

3:00 PM - 3:15 PM

△ [13p-N203-7] Hydrophilicity evaluation of low refractive index SiO₂ Optical Thin Films by Electron Beam and Sputtering Evaporation part2

〇(M1)Mutsuki Ito¹, Shigeharu Matsumoto², Hiroshi Murotani¹ (1.Tokai Univ., 2.SHINCRON Co.,Ltd.)

3:15 PM - 3:30 PM

△ [13p-N203-8] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 4

〇(M2)Taisei Wakamiya¹, Shigeharu Matsumoto², Hiroshi Murotani¹ (1.Graduate School of Eng. Tokai Univ., 2.SHINCRON CO.LTD.)

3:30 PM - 3:45 PM

△ [13p-N203-9] Multilayer with Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (2)

〇(D)Naoya Tajima¹, Shigeharu Matsumoto², Hiroshi Murotani¹ (1.Tokai Univ., 2.SHINCRON CO. LTD.)

3:45 PM - 4:00 PM

▼ [13p-N203-10] Structural stability of 2D II-V compounds

〇(D)Lucia Arellano^1,2, Takayuki Suga¹, Miguel Cruz-Irisson², Jun Nakamura¹ (1.UEC Tokyo, 2.IPN Mexico)

Session information

[13p-N203-1~10] 6.4 Thin films and New materials

[13p-N203-1] Electronic structure measurements of Pt/AlFeO₃/Nb:SrTiO₃ hetero-film for resistance switching material by high resolution X-ray absorption spectroscopy

△ [13p-N203-2] PLD synthesis and characterization of aliovalent-doped layered La-Ni-O system epitaxial films

△ [13p-N203-3] Preliminary synthesis of LiNi_0.67Mn_0.33O₂ epitaxial thin films
for designing compositionally graded thin film LiNi_xMn_yCo_zO₂

△ [13p-N203-4] Photocatalysis of compositionally-graded Mg-doped ZnO thin films

△ [13p-N203-5] Combinatorial synthesis for n-type oxide semiconductor based channel materials for tunnel FETs

△ [13p-N203-6] Fabrication of TiO₂ Optical Thin Film with Low Refractive Index by Combination Deposition

△ [13p-N203-7] Hydrophilicity evaluation of low refractive index SiO₂ Optical Thin Films by Electron Beam and Sputtering Evaporation part2

△ [13p-N203-8] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 4

△ [13p-N203-9] Multilayer with Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (2)

▼ [13p-N203-10] Structural stability of 2D II-V compounds

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Session information

[13p-N203-1~10] 6.4 Thin films and New materials

[13p-N203-1] Electronic structure measurements of Pt/AlFeO3/Nb:SrTiO3 hetero-film for resistance switching material by high resolution X-ray absorption spectroscopy

△ [13p-N203-2] PLD synthesis and characterization of aliovalent-doped layered La-Ni-O system epitaxial films

△ [13p-N203-3] Preliminary synthesis of LiNi0.67Mn0.33O2 epitaxial thin filmsfor designing compositionally graded thin film LiNixMnyCozO2

△ [13p-N203-4] Photocatalysis of compositionally-graded Mg-doped ZnO thin films

△ [13p-N203-5] Combinatorial synthesis for n-type oxide semiconductor based channel materials for tunnel FETs

△ [13p-N203-6] Fabrication of TiO2 Optical Thin Film with Low Refractive Index by Combination Deposition

△ [13p-N203-7] Hydrophilicity evaluation of low refractive index SiO2 Optical Thin Films by Electron Beam and Sputtering Evaporation part2

△ [13p-N203-8] Light Scattering of Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 4

△ [13p-N203-9] Multilayer with Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (2)

▼ [13p-N203-10] Structural stability of 2D II-V compounds

Authenticate

[13p-N203-1] Electronic structure measurements of Pt/AlFeO₃/Nb:SrTiO₃ hetero-film for resistance switching material by high resolution X-ray absorption spectroscopy

△ [13p-N203-3] Preliminary synthesis of LiNi_0.67Mn_0.33O₂ epitaxial thin films
for designing compositionally graded thin film LiNi_xMn_yCo_zO₂

△ [13p-N203-6] Fabrication of TiO₂ Optical Thin Film with Low Refractive Index by Combination Deposition

△ [13p-N203-7] Hydrophilicity evaluation of low refractive index SiO₂ Optical Thin Films by Electron Beam and Sputtering Evaporation part2

△ [13p-N203-8] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 4

△ [13p-N203-9] Multilayer with Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (2)