[10a-N402-1~9] CS.1 Code-sharing Session of 2.3 & 7.5

△ [10a-N402-5] Ultrathinning of window material (Si3N4) using gas cluster ion beam for high-sensitivity XPS measurement of solutions

〇Masaya Takeuchi¹, Reki Fujiwara¹, Noriaki Toyoda¹ (1.Univ. of Hyogo)

Keywords:GCIB, XPS, dry etching

X-ray photoelectron spectroscopy (XPS) has been applied as a technique to analyze the bonding state of molecular with high accuracy. An environmental cell with a window of thin Si3N4 film is utilized to evaluate solutions due to enclosing solutions in a vacuum. In this study, the ultra-low energy irradiation (several eV/atom) of GCIB will be utilized to investigate the Si3N4 film down to about 1 nm in condition of maintaining the mechanical strength.