The 82nd JSAP Autumn Meeting 2021

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[10a-S301-1~10] 8.1 Plasma production and diagnostics

Fri. Sep 10, 2021 9:00 AM - 11:30 AM S301 (Oral)

Naoki Shirai(Hokkaido Univ.)

9:15 AM - 9:30 AM

[10a-S301-2] Electron temperature, density, and energy distribution function diagnostics of the argon low pressure argon plasma generated by an etching unit based on optical emission spectroscopic measurement

Yuya Yamashita1, Takuya Akiba1, Toshihide Iwanaga1, Shuichi Date1, Yamaoka Hidehiko1, Hiroshi Akatsuka2 (1.TIRI, 2.Tokyo Tech)

Keywords:collisional-radiative model, processing plasma, in situ measurement

Electron temperature Te, density Ne, and energy distribution function (EEDF) of the argon low pressure inductively coupled plasma generated by an etching unit were diagnosed by optical emission spectroscopic measurement. In order to reduce diagnostic errors, the dependence of reduced population density distribution on Te, Ne, and EEDF was surveyed. The excitation levels which used for diagnosis were selected based on the survey result. The diagnosis was based on fitting reduced population densities with calculated value by collisional-radiative model and experimental value by OES measurement of emission lines which upper levels were 4p[1/2]1, 4p’[3/2]1, 4p[1/2]0, and 4p’[1/2]0.