[10p-N204-1~17] 6.5 Surface Physics, Vacuum

△ [10p-N204-1] Formation of high quality bismuth telluride thin films by pressure gradient sputtering

〇(M1)Takafumi Komori¹, Yonezawa Susumu², Takashiri Masayuki¹ (1.Tokai Univ., 2.Kenix)

Keywords:sputtering, high vacuum, thin films

Currently, the development of energy harvesting technology and the widespread use of the Internet of Things (loT) have attracted interest in thermoelectric materials. In this study, thin films were deposited using a sputtering method with a pressure gradient. Compared to the conventional sputtering method, the area around the substrate is in a high vacuum state. Therefore, the mean free path of the target particles becomes large, and the target particle incidence is relatively uniform. By using this sputtering system, we aimed to improve the thermoelectric performance by improving the crystal structure.