[10p-N322-1~16] 8.5 Plasma phenomena, emerging area of plasmas and their new applications

[10p-N322-1] Discharge Time Analysis in High Power Pulsed Magnetron Sputtering

〇Masaomi Sanekata¹, Hiroshi Nishida¹, Tatsuya watabe¹, Yuki Nakagomi¹, Yoshihiro Hirai², Nobuo Nishimiya¹, Masahide Tona², Naoyuki Hirata², Hiroaki Yamamoto², Keizo Tsukamoto², Kiyokazu Fuke³, Keijiro Ohshimo⁴, Fuminori MIsaizu⁴ (1.Tokyo Polytech. Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)

Keywords:pulsed sputtering, sputtering plasma, delayed dsicharge

In high power pulsed magnetron sputtering (HPPMS), which is one of the ionization physical vapor deposition methods, modulated pulsed power magnetron sputtering (MPPMS) has attracted attention as a long pulse HPPMS with excellent arcing resistance. In the present study, the Ar pressure dependence of the waveform and time characteristics of the MPPMS discharge and the spectral characteristics of the plasma optical emission were investigated in order to optimize the discharge waveform suitable for improving the ionization rate of MPPMS plasma.