[10p-N322-1~16] 8.5 Plasma phenomena, emerging area of plasmas and their new applications

[10p-N322-2] Optical Emission Spectroscopy of Deep Oscillation Magnetron Sputtering

〇Eisuke Yokoyama¹, Youhei Ono¹, Syoudai Takayama¹, Daiki Sakamoto¹, Nobuo Nishimiya¹, Masaomi Sanekata¹, Masahide Tona², Naoyuki Hirata², Hiroaki Yamamoto², Keizo Tsukamoto², Kiyokazu Fuke³, Keijiro Ohshimo⁴, Fuminori Misaizu⁴ (1.Tokyo Polytech. Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)

Keywords:pulsed sputtering, sputtering plasma, optical emission spectroscopy

In high power pulsed magnetron sputtering (HPPMS), which is one of the ionization physical vapor deposition method, deep oscillation magnetron sputtering (DOMS) applying a pulsed power that consists of comb-like waveform has attracted attention as a diamond-like carbon coating method with arc-free conditions. In this study, time-resolved measurements for optical emission of DOMS plasma were investigated to get information on the atomic and sputtering processes, which are the keys to the control of sputtering deposition in DOMS.