[11a-N321-1~11] 3.7 Laser processing

△ [11a-N321-1] Controlling plasmonic nanoablation on Si induced with double-pulse femtosecond laser

〇Yuto Iida¹, Mika Tateda¹, Godai Miyaji¹ (1.Tokyo Univ. of Agriculture and Technology)

Keywords:femtosecond laser material processing, surface plasmon polariton, silicon

We have observed that a delayed femtosecond (fs) laser pulse can excite plasmonic near-fields on a Si grating transiently metallized with an intense fs laser pulse, and the plasmonic near-fields induce nm-size ablation. The experimental results obtained clearly show that an ablation depth can be controlled with a time delay, and that an weak-fluence fs pulse below the ablation threshold can induce the strong ablation of surfaces through ablation with the plasmonic near-fields.