[11a-N321-1~11] 3.7 Laser processing

△ [11a-N321-6] Homogeneous nanostructures on SiO₂ formed with femtosecond laser pulses and their reflection/transmittance properties

〇Minami Edakubo¹, Juergen Ihlemann², Godai Miyaji¹ (1.Tokyo Univ. of Agriculture and Technology, 2.Institut fuer Nanophotonik Goettingen e.V.)

Keywords:femtosecond laser material processing, SiO2, anti-reflection surface

We formed homogeneous nanostructures on SiO_x (x~1) with femtosecond laser pulses by using a two-step ablation process. After oxidizing SiO_x to SiO₂ by thermal treatment in air, we observed the homogeneously nanostructured surface with an optical microscope. This surface had very low reflectance and around 100% transmittance. The experimental results show that a SiO₂ surface with homogeneous nanostructures by two-step ablation process is an anti-reflection surface.