The 82nd JSAP Autumn Meeting 2021

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[13p-N203-1~10] 6.4 Thin films and New materials

Mon. Sep 13, 2021 1:30 PM - 4:00 PM N203 (Oral)

Tetsuo Tsuchiya(AIST), Hiroaki Nishikawa(Kindai Univ.)

1:30 PM - 1:45 PM

[13p-N203-1] Electronic structure measurements of Pt/AlFeO3/Nb:SrTiO3 hetero-film for resistance switching material by high resolution X-ray absorption spectroscopy

Yuri Endo1, Kato Seiya1, Nakajima Nobuo1, Badari Narayana Rao2, Yasui Shintaro3, Osawa Hitoshi4, Kawamura Naomi4 (1.Hiroshima Univ., 2.Chiba Univ., 3.Tokyo Inst. Tech., 4.JASRI)

Keywords:resistive switching, high energy resolution XAS

In 2020, a resistance switching phenomenon was reported in a Pt/AlFeO3/Nb:SrTiO3 hetero-film. Since the structure of the film is so simple that it is expected to be used in a high-density memory device with 3D integrated structures. Among several proposed mechanisms, we claim that the redox reaction of Fe2+/Fe3+ at the Pt/AlFeO3 interface is essential for resistive switching.
In this study, high-energy resolution fluorescence-detection X-ray absorption spectroscopy was performed to observe the change in the Fe valence state. Given the creation and annihilation of the oxygen vacancy under resistive switching, a slight energy shift of the pre-edge peak and/or appearance of a shoulder structure are expected base on the theoretical simulation. However, no such feature was found in experimental spectra. This clearly concludes that the so-called “filament model”, in which oxygen vacancies partially short-circuit the upper and lower electrodes, are excluded from switching models.