[13p-N302-1~12] 12.1 Fabrications and Structure Controls

△ [13p-N302-5] Fabrication of ionic liquid crystal thin films toward transistor applications

〇(M2)Haruka Komastu¹, Shingo Maruyama¹, Kenichi Kaminaga¹, Yuji Matsumoto¹ (1.Tohoku Univ.)

Keywords:Ionic liquid crystal, thin film, Vaccum deposition

We report smooth and uniform thin film growth of vacuum-deposited 1-hexadecyl-3-methylimidazolium hexafluorophosphate ([C₁₆mim][PF₆]) on SiO₂/Si by a post-annealing in vacuum. While a small grain growth was observed in an as-deposited thin film at room temperature, large plate-like grains over 1 mm with molecular steps were formed after the post-annealing at 110 °C. In addition, the crystallinity along out-of-plane direction was improved by the post-annealing indicated by X-ray diffraction measurements. Results of the post-annealing temperature dependence of grain size and surface roughness suggested that a re-crystallization via Smectic A phase gives such high-quality [C₁₆mim][PF₆] thin films.