[21p-P01-1~31] 2 Ionizing Radiation(Poster)

[21p-P01-31] Ion Extraction from a Duoplasmatron Type ion Source with a Multi Hole Intermediate Electrode

〇(M1)Yusaku Ota¹ (1.doshisha univ.)

Keywords:CMOS image sensors

CMOS image sensors are expected to be applied not only in the imaging field but also in a wide range of fields such as in-vehicle and biomedical applications. However, when the CMOS process is miniaturized, even a small amount of metal and oxygen contamination in the semiconductor wafer can be a factor that greatly reduces the performance of the device. Bicarbonate ion-implanted gettering wafers have been proposed as a technology for dealing with these pollutants, and this research aims to improve this technology.