[22p-P04-1~16] 12.1 Fabrications and Structure Controls

[22p-P04-4] Anti-reflective Thin Films by Electron-Assisted Deposition of Fuluorosilane Derivative

〇Hiroki Kojima¹, Hiroaki Usui¹, Kuniaki Tanaka¹ (1.Tokyo Univ. Agricul & Technol)

Keywords:thin films, vacuum, organic materials

Electron- assisted deposition of fluorinated oligomers (FVTMS), one of the characteristic organic materials, was performed and the optical properties of the resulting thin films were evaluated. FVTMS could not be homogeneously deposited by spin-coating method and agglomerated into droplets by simple deposition, but transparent and continuous films were formed by electron-assisted deposition. Comparing the reflection spectra under each condition, it was confirmed that the formation of the deposition films significantly reduced the reflectance.