[22p-P04-1~16] 12.1 Fabrications and Structure Controls

[22p-P04-5] Physical Vapor Deposition of Antireflection Thin Films Using a Low-Refractive-Index Fluoropolymer

〇Soma Yasui¹, Fujio Ohishi², Kuniaki Tanaka¹, Hiroaki Usui¹ (1.Tokyo Univ. Agricul. & Technol., 2.Kanagawa Univ.)

Keywords:thin films, vacuum, optics

Thin films of Teflon^TM AF were formed by vacuum deposition and electron assisted deposition. By forming the thin film on one side of the glass, the reflectance was reduced from a maximum of 8.2% to 4.8% in the visible region, and the refractive index of the film was as low as about 1.3. The optical properties of the films were not changed by electron beam irradiation. Pencil hardness test showed that the vacuum deposition films failed at 10B, while the electron-assisted deposition films endured up to 4B, showing an improvement in mechanical strength.