[23p-P13-1~22] 17 Nanocarbon Technology(Poster)

[23p-P13-1] Growth of carbon nanowalls (CNW) on semiconductors under biased electric fields

〇(M2)Rucheng Zhu^1,2, RiteshKumar Vishwakarma¹, Masami Naito¹, Masayoshi Umeno¹, Hideo Uchida² (1.C's Techno. Inc., 2.Chubu University)

Keywords:carbon nano wall, Micro Wave Plasma CVD, Battery

Among the main methods for growing CNW at present, direct growth in microwave plasma CVD is an excellent method, and it is characterized by high growth rate and low cost 1). By further applying a bias electric field to the method, we were able to increase the thickness of CNW and at the same time increase the adhesion of the film to the substrate by utilizing the attraction of the negative electrode on carbon ions due ti biasing.