Yutaka Ohno

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Speaker, Author, Co-Author

Fri. Mar 19, 2021 1:00 PM - 4:45 PM Z29 (Z29)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal characterization, impurities and crystal defects

[19p-Z29-1~13] 15.7 Crystal characterization, impurities and crystal defects

1:45 PM - 2:00 PM

[19p-Z29-4] Mechanism for segregation of arsenic dopants at grain boundaries in silicon

〇Yutaka Ohno¹, Yasuo Shimizu^1,5, Jie Ren¹, Tatsuya Yokoi², Koji Inoue¹, Yasuyoshi Nagai¹, Hideto Yoshida³, Kentaro Kutsukake⁴, Kozo Fujiwara¹, Atsutomo Nakamura², Katsushi Matsunaga² (1.IMR, Tohoku Univ., 2.GSE, Nagoya Univ., 3.ISIR, Osaka Univ., 4.RIKEN, 5.NIMS)

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