[17a-Z26-1~9] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[17a-Z26-9] Evaluation of NH₂ conversion and barrier property in eletroless plating treatment of ultra-thin electroless NiB film

〇Takeyasu Saito¹, Masashi Rindo¹, Naoki Okamoto¹, Akira Kitajima² (1.Osaka Pref. Univ., 2.Nanotechnology Facilities, Osaka Univ.)

Keywords:NiB