2021年第68回応用物理学会春季学術講演会

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一般セッション(ポスター講演)

3 光・フォトニクス » 3.11 フォトニック構造・現象

[18p-P03-1~4] 3.11 フォトニック構造・現象

2021年3月18日(木) 13:00 〜 13:50 P03 (ポスター)

13:00 〜 13:50

[18p-P03-2] Fabrication of a Sub-micron-thick Monocrystalline Magneto-optical Garnet Thin Film on Insulator Substrate

〇(D)Siyuan Gao1,2、Yasutomo Ota3、Feng Tian1、Yasuhiko Arakawa3、Satoshi Iwamoto1,2,3 (1.RCAST、2.IIS、3.Nanoquine)

キーワード:magneto-optical effect, hybrid integration, nanophotonics

Thin films of high quality materials on low-refractive-index clad layers and proper handling substrates are essential for exploring nanophotonics using conventional lithography processes, as represented by silicon-on-insulator (SOI) substrates for silicon photonics. The lack of magneto-optical (MO) counterparts of SOI substrates (namely MOOI substrates) seems to hamper the rapid progress of magneto-nanophotonics, despites its importance for non-reciprocal and topological photonic devices leveraging broken time reversal symmetry in MO materials.Previously, we reported a preliminary result on the fabrication of a MOI substrate loading a high-quality monocrystalline yttrium iron garnet (YIG) layer using wafer bonding and grinding. In this report, we discuss the fabrication of a MOI substrate with a sub-micron-thick MO layer by additionally employing a dry etching process, which allows for precise thickness control.