[18p-P03-1~4] 3.11 フォトニック構造・現象

▲ [18p-P03-2] Fabrication of a Sub-micron-thick Monocrystalline Magneto-optical Garnet Thin Film on Insulator Substrate

〇(D)Siyuan Gao^1,2、Yasutomo Ota³、Feng Tian¹、Yasuhiko Arakawa³、Satoshi Iwamoto^1,2,3 (1.RCAST、2.IIS、3.Nanoquine)

キーワード：magneto-optical effect, hybrid integration, nanophotonics

Thin films of high quality materials on low-refractive-index clad layers and proper handling substrates are essential for exploring nanophotonics using conventional lithography processes, as represented by silicon-on-insulator (SOI) substrates for silicon photonics. The lack of magneto-optical (MO) counterparts of SOI substrates (namely MOOI substrates) seems to hamper the rapid progress of magneto-nanophotonics, despites its importance for non-reciprocal and topological photonic devices leveraging broken time reversal symmetry in MO materials.Previously, we reported a preliminary result on the fabrication of a MOI substrate loading a high-quality monocrystalline yttrium iron garnet (YIG) layer using wafer bonding and grinding. In this report, we discuss the fabrication of a MOI substrate with a sub-micron-thick MO layer by additionally employing a dry etching process, which allows for precise thickness control.