3:45 PM - 4:00 PM
[18p-Z17-9] Effect of Oxygen Admixture on Excited-State Number Densities of Low-Pressure Argon Plasma Based on Collisional Radiative Model
Keywords:collisional-radiative model, low-Pressure Argon Plasma, effect of Oxygen Admixture
Diagnostic techniques for measuring the state of the plasma are important for accurate control of the process plasma.According to previous studies, "a method of non-invasively diagnosing the temperature and density of electrons from the number density of excited states obtained by emission spectroscopy based on the collision emission (CR) model" is possible in principle.However, in actual process plasma, there is a concern that the mixing of process gas will affect the excited state.
Therefore, in this study, we investigated the effect on the number density of excited states by incorporating a loss term assuming oxygen molecule contamination into the ArCR model of low-pressure Ar plasma, which is often used for process plasma.
Therefore, in this study, we investigated the effect on the number density of excited states by incorporating a loss term assuming oxygen molecule contamination into the ArCR model of low-pressure Ar plasma, which is often used for process plasma.