The 83rd JSAP Autumn Meeting 2022

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Oral presentation

21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20p-B203-1~22] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Tue. Sep 20, 2022 1:00 PM - 7:00 PM B203 (B203)

Takeyoshi Onuma(Kogakuin Univ.), Hiroyuki Nishinaka(Kyoto Inst. of Tech.)

1:00 PM - 1:15 PM

[20p-B203-1] Impact of Au surfactant on composition and optical properties of gallium oxysulfide films

〇(D)Weiqi Zhou1, Takuto Soma1, Akira Ohtomo1 (1.Tokyo Tech)

Keywords:gallium oxide, PLD, sulfur substitution

β-Ga2O3 is a wide bandgap semiconductor that is expected to be applied for the next-generation power devices. However, the lack of p-type materials largely restricts its applicability. To realize the Ga2O3-based p-type materials, our group proposed a N-doping method by using pulsed-laser deposition (PLD) technique and succeed in growing β-Ga2O3 films with high N concentration and high crystallinity. Due to the deep acceptor level of N, however, p-type behavior has not been found yet. We also investigated an approach for activation of N acceptors: making valence band maximum shallower by substituting O atoms with isovalent S atoms. In this study, we examine roles of a Au surfactant in the growth of gallium oxysulfide films and find enhanced S incorporation probably due to Au-thiol bonding.